An update on the polymer-initiated Chemical Vapor Deposition (iCVD) instrument funded by an NSF-MRI grant and being built in the Chemical Engineering Department at Manhattan College
In iCVD, gas phase monomers adsorb and form thin, conformal, solid polymer films on different substrates. The ‘dry’ technique allows decoupling of activation and polymerization temperatures, which makes it versatile for many polymers for a variety of end applications. The objective of the project being executed at Manhattan College is to build a novel instrument for polymer iCVD that offers additional capabilities over state-of-the-art instruments:
• In situ structural characterization of the polymer films
• Built-in slot for lamp to perform photo-initiated deposition
• System for delivery of very low-vapor-pressure monomers
• Operation at positive pressures to enable polymerization of high-vapor-pressure monomers
• Option to direct outlet flow to a gas chromatograph to enable photocatalytic studies
Assembly of the instrument is nearing completion as of fall 2023 and testing of its capabilities will begin soon with the assistance of a graduate assistant funded by the project. View the award abstract on the NSF website.
Presented by Dr. Aravind Suresh, Assistant Professor of Chemical Engineering at Manhattan College.
The meeting is in cooperation with the Manhattan College AIChE Student Chapter.
The meeting will be Thursday, 10/26/23 at 6 – 8 PM. At
Manhattan College
Room 215, LEO Hall
3825 Corlear Avenue,
Bronx, NY 10463